| Reactor Operation | Batch, semi-batch, or continuous flow | Choose a batch vessel for flexible laboratory work; use a flow tube for continuous processing | Batch reactors provide easier charging, sampling, and cleaning. Flow reactors offer better residence-time control and are suitable for steady-state operation. | Photochemistry, catalyst testing, thermal treatment, gas–solid reactions |
| Reactor Geometry | Cylindrical vessel, straight tube, annular tube, or multi-zone tube | Select the geometry that provides uniform exposure and sufficient working volume | Cylindrical vessels are practical for stirring. Straight tubes simplify gas flow. Annular designs can improve light delivery when the optical path must be short. | UV reactions, plasma-assisted processes, gas-phase reactions, thin-film processing |
| Working Volume | Small laboratory scale to pilot-scale volume | Size the reactor for the required charge volume while maintaining adequate headspace | Do not fill a batch reactor completely. Allow space for thermal expansion, gas disengagement, mixing, and safe pressure control. The working volume should be defined separately from total volume. | Screening experiments, scale-up studies, process development |
| Light Transmission | Deep-UV, UV, visible, or infrared exposure | Use high-purity fused quartz when transmission below approximately 300 nm is required | Fused quartz generally transmits ultraviolet and visible radiation better than ordinary glass. Transmission depends on material grade, wall thickness, surface condition, wavelength, and impurities. | Photocatalysis, UV curing, photolysis, semiconductor research |
| Temperature Range | Ambient, elevated temperature, or thermal cycling | Use quartz for high-temperature service only with controlled heating and cooling rates | Quartz has a very low coefficient of thermal expansion and good thermal-shock resistance, but it can still fracture from localized heating, impact, scratches, or rapid uneven cooling. | Calcination, thermal decomposition, annealing, high-temperature synthesis |
| Pressure Mode | Atmospheric, vacuum, low positive pressure, or pressure-rated design | Use an open or vented configuration for atmospheric work; require engineering validation for vacuum or positive pressure | Quartz is brittle and does not tolerate pressure abuse. Wall thickness, diameter, shape, supports, seals, and temperature must be evaluated together. Never assume a standard tube is pressure-rated. | Vacuum processing, inert-gas reactions, controlled-atmosphere experiments |
| Atmosphere Control | Air, nitrogen, argon, oxygen, hydrogen-containing gas, or mixed gases | Select inlet and outlet ports with controlled flow paths and appropriate gas-handling components | Provide a gas inlet, outlet, purge route, and pressure-relief strategy where required. Gas compatibility must include the quartz, tubing, valves, fittings, and seals. | Oxidation, reduction, inert processing, catalytic gas reactions |
| Mixing Requirement | No mixing, magnetic stirring, mechanical stirring, or gas bubbling | Use a flat-bottom or round-bottom vessel with a suitable stirrer for liquid-phase batch reactions | Stirring improves temperature and concentration uniformity. Confirm that the stir bar or shaft will not strike the quartz surface, especially during high-speed operation. | Liquid-phase synthesis, dissolution, extraction, photocatalytic suspension reactions |
| Heating Method | Heating mantle, furnace, hot plate, infrared source, or external lamp | Match the reactor shape to the heat source to minimize thermal gradients | Use thermocouples or other sensors that do not create stress points. External heating should be uniform, and direct flame contact should be avoided unless the assembly is specifically designed for it. | Thermal synthesis, gas-phase processing, evaporation, heat-treatment studies |
| Optical Access | Side illumination, top illumination, immersion lamp, or external lamp exposure | Choose a clear optical path with the shortest practical distance between the light source and reaction zone | Consider lamp spectrum, reactor wall thickness, liquid absorbance, scattering, fouling, and cooling requirements. A quartz window or immersion well may be needed for efficient UV delivery. | Photocatalysis, photochemical synthesis, UV disinfection, photoelectrochemical studies |
| Port Configuration | Single neck, multi-neck, side ports, dip tube, sampling port, or cooling port | Specify only the ports required for charging, sampling, gas handling, sensing, and cleaning | Additional ports increase assembly complexity and potential leak points. Port placement should avoid shadowing the reaction zone and should allow maintenance access. | Instrumented experiments, controlled-atmosphere reactions, sampling-intensive workflows |
| Sealing System | Open top, ground-glass joint, compression fitting, elastomer seal, or fused connection | Select seals based on temperature, vacuum level, chemicals, and optical requirements | Quartz may be chemically resistant while the sealing material is not. Check elastomer compatibility, permeation, outgassing, thermal limits, and differential expansion between materials. | Vacuum work, gas-tight photochemistry, heated liquid reactions |
| Chemical Compatibility | Acidic, oxidizing, aqueous, organic, or high-purity environments | Use fused quartz for applications requiring high purity and broad chemical resistance | Quartz is resistant to many acids and aqueous solutions, but it is attacked by hydrofluoric acid and hot concentrated alkaline solutions. Verify compatibility at the actual concentration and temperature. | High-purity synthesis, acid treatment, aqueous processing, UV reactions |
| Cleaning and Maintenance | Manual rinsing, solvent cleaning, acid cleaning, or thermal cleaning | Choose smooth internal surfaces and removable components for frequent cleaning | Avoid abrasive tools and sudden temperature changes. Scratches, chips, and impact damage can significantly reduce mechanical reliability. | Shared laboratory reactors, high-purity processes, repeated photochemical cycles |
| Process Monitoring | Temperature, pressure, pH, dissolved oxygen, gas flow, optical intensity, or sampling | Add sensor ports without obstructing flow, stirring, or illumination | Sensor location affects measurement accuracy. For optical processes, probes and fittings should be positioned to reduce shadowing and unwanted reflection. | Reaction optimization, kinetic studies, quality control, scale-up validation |
| Scale-Up Strategy | Increase vessel volume, use parallel reactors, or move from batch to flow | Scale based on heat transfer, light penetration, mixing, residence time, and gas–liquid contact—not volume alone | Optical path length and surface-area-to-volume ratio can change process performance. Parallel small reactors may provide more consistent exposure than a single large vessel. | Process development, pilot testing, production feasibility studies |